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A novel analytical approach to describe the simultaneous diffusional growth of multilayer stoichiometric compounds in binary reactive diffusion couples
- Source :
- Scripta Materialia. 191:111-115
- Publication Year :
- 2021
- Publisher :
- Elsevier BV, 2021.
-
Abstract
- In this paper, we developed a novel analytical approach for description of the diffusion-controlled simultaneous growth of multilayer stoichiometric compounds in binary reactive diffusion couples. The approach was directly extended to describe the compounds with narrow/certain homogeneity ranges. The models were then applied to three different real cases in technically important Co–Si and Cu–In binary systems. The predicted thickness curves/composition profiles revealed a satisfactory agreement with all the experimental data. The successful applications indicate that the approach can serve as an efficient way for describing the multi-layer growth in the joining, coating, and solar cell industries.
- Subjects :
- 010302 applied physics
Materials science
Mechanical Engineering
Metals and Alloys
Binary number
Thermodynamics
02 engineering and technology
engineering.material
021001 nanoscience & nanotechnology
Condensed Matter Physics
01 natural sciences
law.invention
Coating
Mechanics of Materials
law
0103 physical sciences
Homogeneity (physics)
Solar cell
engineering
General Materials Science
0210 nano-technology
Stoichiometry
Subjects
Details
- ISSN :
- 13596462
- Volume :
- 191
- Database :
- OpenAIRE
- Journal :
- Scripta Materialia
- Accession number :
- edsair.doi...........cc03a54312cac6197229b0de1e7cd470