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Solution Growth of Silicon Carbide Using Fe–Si Solvent

Authors :
Sakiko Kawanishi
Toshihiro Tanaka
Takeshi Yoshikawa
Source :
Japanese Journal of Applied Physics. 49:051302
Publication Year :
2010
Publisher :
IOP Publishing, 2010.

Abstract

In this paper, we describe the use of liquid Fe–Si alloy as the solvent for the solution growth of silicon carbide (SiC). Iron was chosen owing to the high solubility of carbon in molten iron. The crystal growth of SiC from Fe–40 mol % Si solvent on a seed crystal wafer of 6H- or 4H-SiC was carried out at 1,623–1,723 K using induction heating. The growth rate of SiC was obtained to be 90–260 µm/h. Furthermore, Raman spectroscopy revealed homo epitaxial growth on both 6H- and 4H-SiC under the experimental conditions used. Thus, the Fe–Si solvent was found to be effective for the rapid solution growth of SiC.

Details

ISSN :
13474065 and 00214922
Volume :
49
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........cb9acf4f6a7448a2b3bef81b41c08f18
Full Text :
https://doi.org/10.1143/jjap.49.051302