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Computer Simulation and Controlled Growth of Large Diameter Czochralski Silicon Crystals
- Source :
- Journal of The Electrochemical Society. 130:1156-1160
- Publication Year :
- 1983
- Publisher :
- The Electrochemical Society, 1983.
-
Abstract
- Computer simulation leading to controlled large diameter Czochralski crystal growth is discussed. A simple mathematical model, which describes the different crystal growth phases including neck‐in, fast flat top, roll‐over to constant diameter bulk growth, and tail‐off is presented. This model, in conjunction with a computer‐implemented simulator, is used to simulate silicon crystal growth. Good agreement between simulation results and experimental crystal growth is obtained.
- Subjects :
- Fabrication
Temperature control
Silicon
Solid-state physics
Mathematical model
Renewable Energy, Sustainability and the Environment
business.industry
chemistry.chemical_element
Crystal growth
Condensed Matter Physics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Monocrystalline silicon
Optics
chemistry
Materials Chemistry
Electrochemistry
Optoelectronics
business
Single crystal
Subjects
Details
- ISSN :
- 19457111 and 00134651
- Volume :
- 130
- Database :
- OpenAIRE
- Journal :
- Journal of The Electrochemical Society
- Accession number :
- edsair.doi...........cb9a699184055cb24bd58f667ab134ea
- Full Text :
- https://doi.org/10.1149/1.2119907