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Computer Simulation and Controlled Growth of Large Diameter Czochralski Silicon Crystals

Authors :
A. Kran
K. M. Kim
P. Smetana
G. H. Schwuttke
Source :
Journal of The Electrochemical Society. 130:1156-1160
Publication Year :
1983
Publisher :
The Electrochemical Society, 1983.

Abstract

Computer simulation leading to controlled large diameter Czochralski crystal growth is discussed. A simple mathematical model, which describes the different crystal growth phases including neck‐in, fast flat top, roll‐over to constant diameter bulk growth, and tail‐off is presented. This model, in conjunction with a computer‐implemented simulator, is used to simulate silicon crystal growth. Good agreement between simulation results and experimental crystal growth is obtained.

Details

ISSN :
19457111 and 00134651
Volume :
130
Database :
OpenAIRE
Journal :
Journal of The Electrochemical Society
Accession number :
edsair.doi...........cb9a699184055cb24bd58f667ab134ea
Full Text :
https://doi.org/10.1149/1.2119907