High-precision nanoscale length measurement

Modern lithographical methods used to create linear measures for nanometer-range dimensions and the main factors which limit the applications of such gages have been analyzed in the paper. Prospects for developing high-precision measures based on an atomically structured crystalline surface (containing monoatomic steps) whose parameters are bound to the crystallographic parameters of the crystal (traceable to the length measure) are shown. A method which can be used to create such measures based on controlling the surface morphology of monocrystalline silicon at an atomic level due to the effects of self-organization arising at the atomically clean surface as a result of annealing in ultrahigh vacuum is proposed. A description of the set of high-precision gages of vertical dimensions STEPP-IFP-1 in a size range of 0.31–31 nm with an error in the whole interval of gages of less than 0.05 nm is presented. The set of high-precision gages after carrying out state testing is included into the state registry of measuring means as measuring type no. 48115-11 (Federal Agency on Technical Regulating and Metrology order no. 6290 of October 31, 2011).