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The characteristic parameters of initiating defects in HfO2/SiO2high-reflector multilayer thin film at wavelength of 1064 nm

Authors :
Jianda Shao
Baohe Li
Xiao Li
Source :
The European Physical Journal Applied Physics. 67:30301
Publication Year :
2014
Publisher :
EDP Sciences, 2014.

Subjects

Subjects :
Wavelength
Materials science
Optical coating
business.industry
Optoelectronics
Reflector (antenna)
Thin film
Condensed Matter Physics
business
Instrumentation
Electronic, Optical and Magnetic Materials

Details

ISSN :
12860050 and 12860042
Volume :
67
Database :
OpenAIRE
Journal :
The European Physical Journal Applied Physics
Accession number :
edsair.doi...........c88462c6a89759805685e50203dc70fb
Full Text :
https://doi.org/10.1051/epjap/2014140078
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