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Structural Effects On Charging Damage

Authors :
S. Hosoda
Y. Muraki
Source :
2nd International Symposium on Plasma Process-Induced Damage.
Publication Year :
1997
Publisher :
IEEE, 1997.

Subjects

Subjects :
Fabrication
Ion implantation
Materials science
Resist
business.industry
Analytical chemistry
Optoelectronics
Dry etching
Electron
Reactive-ion etching
business
Plasma processing
Plasma-immersion ion implantation

Details

Database :
OpenAIRE
Journal :
2nd International Symposium on Plasma Process-Induced Damage
Accession number :
edsair.doi...........c8298facf926275db60f42e71461d2b9
Full Text :
https://doi.org/10.1109/ppid.1997.596720
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