Characterization of GaN/Si Using Capacitance Spectroscopies

Layers of GaN deposited on Si substrates have been studied using Thermal Admittance Spectroscopy (TAS) and Optical Admittance Spectroscopy (OAS). Transparent front-side contacts were used to facilitate the optical measurements. Six specimens were cut from the same location in two different wafers, and three samples were randomly chosen from other growths. A shallow level at EC − 0.051 eV was found in all the specimens using TAS. In some specimens this peak was asymmetric, indicating more than one level near this energy. Deeper levels were also seen in the high-temperature portion of the spectra, but were poorly resolved in most specimens. Illuminating the specimen with UV light at 25 K resulted in the thermal position of the peak shifting to a lower temperature, and hence, the calculated energy, of the peak shifting lower. The amplitude of the peak also decreased. Transient OAS measurements revealed the interesting phenomenon of negative persistent photo conductance at room temperature in some of the specimens when the illumination photon energy was less than the bandgap. The negative response time was very short. At lower temperatures, below 100 K, the negative response diminished, but the response time was still short. At wavelengths above the bandgap energy, normal transient response was seen, with a longer time constant.