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Optimized‐geometry ARROW waveguides using TiO 2 as anti‐resonant layer
- Source :
- physica status solidi c. 7:716-719
- Publication Year :
- 2010
- Publisher :
- Wiley, 2010.
-
Abstract
- The simulation, fabrication and characterization of ARROW waveguides using dielectric films deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) and Sputtering techniques, are presented in this work. Amorphous titanium oxide (TiO2) films were used as first cladding layer and silicon oxynitride (SiOxNy) films, as core layer. Furthermore, homemade routines based in two computational methods were used, for numerical simulations: Transfer Matrix Method (TMM) for the determination of the optimum thickness values of the Fabry-Perot layers, and the Finite Difference Method (FDM) for 2D design and determination of the maximum width that allows single-mode operation. The utilization of thermally grown silicon oxide as second anti-resonant layer, along with improvements in the Reactive Ion Etching conditions for the definition of sidewalls of the optical waveguides were responsible for diminishing optical attenuations. Optimization of the waveguide rib height was done both through FDM simulations and experimentally. (© 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
- Subjects :
- Silicon oxynitride
Materials science
business.industry
Condensed Matter Physics
Cladding (fiber optics)
Waveguide (optics)
Amorphous solid
chemistry.chemical_compound
Optics
chemistry
Plasma-enhanced chemical vapor deposition
Sputtering
Optoelectronics
Reactive-ion etching
Silicon oxide
business
Subjects
Details
- ISSN :
- 16101642 and 18626351
- Volume :
- 7
- Database :
- OpenAIRE
- Journal :
- physica status solidi c
- Accession number :
- edsair.doi...........c773f3fda1414441d1ce8ed7aa80a65c