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Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning
- Source :
- Journal of Micro/Nanopatterning, Materials, and Metrology. 21
- Publication Year :
- 2022
- Publisher :
- SPIE-Intl Soc Optical Eng, 2022.
Details
- ISSN :
- 27088340
- Volume :
- 21
- Database :
- OpenAIRE
- Journal :
- Journal of Micro/Nanopatterning, Materials, and Metrology
- Accession number :
- edsair.doi...........c6d2c71f46c7db1f1669c3676818ec97