Reflection mask technology for x-ray projection lithography

Authors :: Andrew M. Hawryluk
David P. Gaines
Natale M. Ceglio
Source :: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 7:1702
Publication Year :: 1989
Publisher :: American Vacuum Society, 1989.
Abstract: We report the first demonstration of the fabrication and characterization of soft x‐ray reflecting masks suitable for x‐ray projection lithography. We have patterned efficient (R>50%) normal‐incidence x‐ray mirrors to produce reflecting masks with measured x‐ray contrasts>500:1 over a sufficiently wide spectral range. Calculations indicate that masks on silicon substrates are thermally stable for a production‐type lithographic facility.

Subjects :: Diffraction
Fabrication
Materials science
Silicon
business.industry
General Engineering
chemistry.chemical_element
Integrated circuit
law.invention
Optics
Reflection (mathematics)
chemistry
law
Optoelectronics
business
Projection (set theory)
Image resolution
Lithography

ISSN :: 0734211X
Volume :: 7
Database :: OpenAIRE
Journal :: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Accession number :: edsair.doi...........c6a0836d2bfcf816d986299e1a153e74
Full Text :: https://doi.org/10.1116/1.584486