Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer-based positive-tone photoresist materials

Guorong Sun, Sangho Cho, Fan Yang, Xun He, Adriana Pav ia-Sanders, Corrie Clark, Jeffery E. Raymond, Stanislav V. Verkhoturov, Emile A. Schweikert, James W. Thackeray, Peter Trefonas, Karen L. Wooley Department of Chemistry, Texas A&M University, College Station, Texas 77842 Department of Chemical Engineering, Texas A&M University, College Station, Texas 77842 Department of Materials Science and Engineering, Texas A&M University, College Station, Texas 77842 Laboratory for Synthetic-Biologic Interactions, Texas A&M University, College Station, Texas 77842 Dow Electronic Materials, Marlborough, Massachusetts 01752 Correspondence to: J. W. Thackeray (E-mail: jthackeray@dow.com) or P. Trefonas (E-mail: ptrefonas@dow.com) or K. L. Wooley (E-mail: wooley@chem.tamu.edu)