On influence of collimating slit imperfections on the quality of experimental data in high-resolution x-ray diffraction

High-resolution x-ray diffraction and imaging techniques commonly assume a well-defined plane wave incident on the sample. Experimentally, the wave-front is limited by a collimating slit. Slit imperfections, such as surface roughness on the edges, may significantly contribute to the formation of the diffraction pattern from a specimen placed behind the slit. These effects become more profound when imaging at the nano-scale. This Letter presents experimental and simulated x-ray diffraction data quantitatively demonstrating the influence of slit edge imperfections on the formation of the diffraction pattern in the far-field regime.