Low-Temperature Silicon Epitaxy for Atomic Precision Devices

MLA

James Anthony Ohlhausen, et al. “Low-Temperature Silicon Epitaxy for Atomic Precision Devices.” ECS Transactions, vol. 93, Oct. 2019, pp. 37–40. EBSCOhost, https://doi.org/10.1149/09301.0037ecst.

APA

James Anthony Ohlhausen, Ting S. Luk, Daniel R. Ward, Michael T. Marshall, Paul G. Kotula, Tzu-Ming Lu, Aaron M. Katzenmeyer, Evan M. Anderson, Ping Lu, Ezra Bussmann, DeAnna M. Campbell, & Shashank Misra. (2019). Low-Temperature Silicon Epitaxy for Atomic Precision Devices. ECS Transactions, 93, 37–40. https://doi.org/10.1149/09301.0037ecst

Chicago

James Anthony Ohlhausen, Ting S. Luk, Daniel R. Ward, Michael T. Marshall, Paul G. Kotula, Tzu-Ming Lu, Aaron M. Katzenmeyer, et al. 2019. “Low-Temperature Silicon Epitaxy for Atomic Precision Devices.” ECS Transactions 93 (October): 37–40. doi:10.1149/09301.0037ecst.