Electrical and field emission investigation of individual carbon nanotubes from plasma enhanced chemical vapour deposition

Plasma enhanced chemical vapour deposition (PECVD) is a controlled technique for the production of vertically aligned multiwall carbon nanotubes for field emission applications. In this paper, we investigate the electrical properties of individual carbon nanotubes which is important for designing field emission devices. PECVD nanotubes exhibit a room temperature resistance of 1–10 kΩ/μm length (resistivity 10 −6 to 10 −5 Ω m) and have a maximum current carrying capability of 0.2–2 mA (current density 10 7 –10 8 A/cm 2 ). The field emission characteristics show that the field enhancement of the structures is strongly related to the geometry (height/radius) of the structures and maximum emission currents of ∼10 μA were obtained. The failure of nanotubes under field emission is also discussed.