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Full chip model based correction of flare-induced linewidth variation
- Source :
- Optical Microlithography XVIII.
- Publication Year :
- 2005
- Publisher :
- SPIE, 2005.
Details
- Database :
- OpenAIRE
- Journal :
- Optical Microlithography XVIII
- Accession number :
- edsair.doi...........c157fd81c0a60ecb27c7a5913a210b2d
- Full Text :
- https://doi.org/10.1117/12.601182