Excellent resistive switching property and physical mechanism of amorphous TiO2 thin films fabricated by a low-temperature photochemical solution deposition method

High-performance resistive switching Pt/TiO2/Pt memory cells were fabricated. The amorphous TiO2 active layer was prepared by using a low-temperature photochemical solution deposition method—a simple preparation process combining first chemical solution deposition of the TiO2 film layer and subsequent ultraviolet (UV) irradiation treatment. The obtained Pt/TiO2/Pt memory cells exhibited excellent resistive switching parameters, such as centralized distribution of set and reset voltages, stable current values at high and low resistance states, and long retention time. The conductive mechanisms of high resistance state and low resistance state were Schottky emission and Ohmic conduction, respectively. The X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, and scanning electron microscopy characterization of the TiO2 thin films indicated that the UV irradiation treatment can lead to decomposition of the residual organics and the formation of enhanced metal-oxide bonds in the thin films. On the basis of the analysis of current–voltage characteristics and the temperature dependence of resistance, we explained the resistive switching phenomenon for Pt/TiO2/Pt devices by using the model of formation/rupture of conductive filaments. Our study also suggested that the simple photochemical solution deposition method can be used for preparing some other oxide thin films with good resistive switching properties at low processing temperature which is promising to be extended to flexible resistive switching devices.