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Fabrication Process and Properties of Nb-InSb-Nb Planar Junction

Authors :
Hiroyuki Akaike
Yoshiaki Takai
Hisao Hayakawa
Tsunehiro Hato
Source :
Japanese Journal of Applied Physics. 31:1039
Publication Year :
1992
Publisher :
IOP Publishing, 1992.

Abstract

A Nb-InSb-Nb planar junction with a normal layer of InSb thin film was fabricated by a new process. In this report, the details of the fabrication process and properties of the junction are discussed. The Nb-InSb-Nb junction fabricated using the new process showed a supercurrent. This means that there is no notable barrier, such as the Schottky barrier at the interface between Nb and InSb. The InSb film has a mobility of 500∼700 cm2/V·s, which is 17∼23 times larger than that of Si. This makes it possible to realize the superconductor-semiconductor-superconductor junction with a low carrier density of 1017 cm-3.

Details

ISSN :
13474065 and 00214922
Volume :
31
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........bf32e10602a48d803e7e4b070a233fb5
Full Text :
https://doi.org/10.1143/jjap.31.1039