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A 1.1 V 2y-nm 4.35 Gb/s/pin 8 Gb LPDDR4 Mobile Device With Bandwidth Improvement Techniques

Authors :
Wooyeol Shin
Keun-Soo Song
Jeonghun Lee
Duck-Hwa Hong
Young-Bo Shim
Yongdeok Cho
Jinkook Kim
Joo-Hwan Cho
Sang-Kwon Lee
Woo-Young Lee
Eunryeong Lee
Jaemo Yang
Jaewoong Yun
Sang Il Park
Dongkyun Kim
Hyeongon Kim
Hae-Kang Jung
Namkyu Jang
Hyeng-Ouk Lee
Bokrim Ko
Yongsuk Joo
Source :
IEEE Journal of Solid-State Circuits. 50:1945-1959
Publication Year :
2015
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2015.

Abstract

The demands on higher bandwidth with reduced power consumption in mobile market are driving mobile DRAM with advanced design techniques. Proposed LPDDR4 in this paper achieves over 39% improvement in power efficiency and over 4.3 Gbps data rate with 1.1 V supply voltage. These are challenging targets compared with those of LPDDR3. This work describes design schemes employed in LPDDR4 to satisfy these requirements, such as multi-channel-per-die architecture, multiple training modes, low-swing interface, DQS and clock frequency dividing, and internal reference for data and command-address signals. This chip was fabricated in a 3-metal 2y-nm DRAM CMOS process.

Details

ISSN :
1558173X and 00189200
Volume :
50
Database :
OpenAIRE
Journal :
IEEE Journal of Solid-State Circuits
Accession number :
edsair.doi...........bd3ecdd5a1b8474a68f8bb2d19ea9028