Ultrathin Aluminum Oxide Films Induced by Rapid Thermal Annealing for Effective Silicon Surface Passivation

Subjects

Subjects :

Materials science
Passivation
Chemical engineering
Silicon
chemistry
chemistry.chemical_element
General Materials Science
Activation energy
Rapid thermal annealing
Condensed Matter Physics
Aluminum oxide

Details

ISSN :

18626270 and 18626254

Volume :

15

Database :

OpenAIRE

Journal :

physica status solidi (RRL) – Rapid Research Letters

Accession number :

edsair.doi...........bcf6b28243831e78171f31613eac2099

Full Text :

https://doi.org/10.1002/pssr.202100267