Cite

First principles investigation of defects at interfaces between silicon and amorphous high-κ oxides

MLA

Alfredo Pasquarello, and Peter Broqvist. “First Principles Investigation of Defects at Interfaces between Silicon and Amorphous High-κ Oxides.” Microelectronic Engineering, vol. 84, Sept. 2007, pp. 2022–27. EBSCOhost, https://doi.org/10.1016/j.mee.2007.04.075.



APA

Alfredo Pasquarello, & Peter Broqvist. (2007). First principles investigation of defects at interfaces between silicon and amorphous high-κ oxides. Microelectronic Engineering, 84, 2022–2027. https://doi.org/10.1016/j.mee.2007.04.075



Chicago

Alfredo Pasquarello, and Peter Broqvist. 2007. “First Principles Investigation of Defects at Interfaces between Silicon and Amorphous High-κ Oxides.” Microelectronic Engineering 84 (September): 2022–27. doi:10.1016/j.mee.2007.04.075.