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Effects of pre-sputtered Al interlayer on the atomic layer deposition of Al2O3 films on Mg–10Li–0.5Zn alloy

Authors :
M.T. Yeh
H.C. Lin
Tai-Shan Cheng
Miin-Jang Chen
K.M. Lin
P.C. Wang
Source :
Applied Surface Science. 270:452-456
Publication Year :
2013
Publisher :
Elsevier BV, 2013.

Abstract

In this study, a dual-layer of Al/Al2O3 films was deposited on the Mg–10Li–0.5Zn substrate using both techniques of magnetron sputtering and atomic layer deposition (ALD). The pre-sputtered Al interlayer has a crystalline structure and the ALD-Al2O3 film is amorphous. The Al interlayer could effectively obstruct the diffusion out of Li atoms from the Mg–10Li–0.5Zn substrate during the deposition of ALD-Al2O3 film. The Mg–10Li–0.5Zn specimen with a dual-layer of Al/Al2O3 films exhibits a much better corrosion resistance than those specimens with a single layer of sputtered Al or ALD-Al2O3.

Details

ISSN :
01694332
Volume :
270
Database :
OpenAIRE
Journal :
Applied Surface Science
Accession number :
edsair.doi...........bc858ce2e53f5e00d0aa13673d41c4c2