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Removal of Surface Contamination by Atomic Hydrogen Annealing

Authors :
Akira Heya
Tetsuo Harada
Takeo Watanabe
Koji Sumitomo
Masahito Niibe
Source :
Journal of Photopolymer Science and Technology. 33:419-426
Publication Year :
2020
Publisher :
Technical Association of Photopolymers, Japan, 2020.

Subjects

Subjects :
Hydrogen annealing
Surface (mathematics)
Materials science
Polymers and Plastics
Organic Chemistry
Metallurgy
Materials Chemistry
Contamination

Details

ISSN :
13496336 and 09149244
Volume :
33
Database :
OpenAIRE
Journal :
Journal of Photopolymer Science and Technology
Accession number :
edsair.doi...........bb1735b3bdff95ea2bae6af9b353cabd
Full Text :
https://doi.org/10.2494/photopolymer.33.419
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