Using CD-SEM metrology in the manufacture of semiconductors

MLA

John M. McIntosh. “Using CD-SEM Metrology in the Manufacture of Semiconductors.” JOM, vol. 51, Mar. 1999, pp. 38–39. EBSCOhost, https://doi.org/10.1007/s11837-999-0027-5.

APA

John M. McIntosh. (1999). Using CD-SEM metrology in the manufacture of semiconductors. JOM, 51, 38–39. https://doi.org/10.1007/s11837-999-0027-5

Chicago

John M. McIntosh. 1999. “Using CD-SEM Metrology in the Manufacture of Semiconductors.” JOM 51 (March): 38–39. doi:10.1007/s11837-999-0027-5.