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Ferroelectric C-Axis Textured Aluminum Scandium Nitride Thin Films of 100 nm Thickness
- Source :
- 2020 Joint Conference of the IEEE International Frequency Control Symposium and International Symposium on Applications of Ferroelectrics (IFCS-ISAF).
- Publication Year :
- 2020
- Publisher :
- IEEE, 2020.
-
Abstract
- We report on the properties of Aluminum Scandium Nitride (AlScN) thin films deposited by pulsed-DC co-sputtering. We present the impact of the nitrogen-to-argon gas ratio on the crystal growth orientation, film stress, surface roughness, scandium concentration, and deposition rate of 760-860 nm thick AlScN thin films on Ti/Pt (111). We utilize the optimized process conditions from this study to deposit thin layers of AlScN and to explore the nucleation and orientation of thin AlScN layers on Ti/Pt (111). We report on the ferroelectric properties of 100 nm thick AlScN materials.
- Subjects :
- 010302 applied physics
Thin layers
Materials science
Nucleation
chemistry.chemical_element
Crystal growth
02 engineering and technology
021001 nanoscience & nanotechnology
01 natural sciences
Ferroelectricity
chemistry
Aluminium
0103 physical sciences
Surface roughness
Scandium
Thin film
Composite material
0210 nano-technology
Subjects
Details
- Database :
- OpenAIRE
- Journal :
- 2020 Joint Conference of the IEEE International Frequency Control Symposium and International Symposium on Applications of Ferroelectrics (IFCS-ISAF)
- Accession number :
- edsair.doi...........b95ce71a5cfa95ca43d2d330da25f7d1