Study of Nanosecond Laser Annealing on Silicon Doped Hafnium Oxide Film Crystallization and Capacitor Reliability

MLA

Ali, Tarek Nadi Ismail, et al. Study of Nanosecond Laser Annealing on Silicon Doped Hafnium Oxide Film Crystallization and Capacitor Reliability. Jan. 2022. EBSCOhost, https://doi.org/10.24406/h-429204.

APA

Ali, T. N. I., Revello Olivo, R. O., Kerdiles, S., Lehninger, D., Lederer, M., De, S., Royet, A.-S., Sünbül, A., Prabhu, A., Kühnel, K., Czernohorsky, M., Rudolph, M., & Hoffmann, R. (2022). Study of Nanosecond Laser Annealing on Silicon Doped Hafnium Oxide Film Crystallization and Capacitor Reliability. https://doi.org/10.24406/h-429204

Chicago

Ali, Tarek Nadi Ismail, Ricardo Orlando Revello Olivo, S. Kerdiles, David Lehninger, Maximilian Lederer, Sourav De, A.-S. Royet, et al. 2022. “Study of Nanosecond Laser Annealing on Silicon Doped Hafnium Oxide Film Crystallization and Capacitor Reliability,” January. doi:10.24406/h-429204.