P‐7.9: Advanced Halftone Photolithography Using Four‐Mask Process Architecture for G8.6 TFT‐LCDs

Authors :: Feng-yun Yang
Qiong-hua Mo
Bang-tong Ge
Kai-jun Liu
Jeff Zhou
James Hsu
Wei Chao
Zhen Liu
York Lu
Ting-ting Fu
Wade Chen
An-Thung Cho
Source :: SID Symposium Digest of Technical Papers. 50:822-825
Publication Year :: 2019
Publisher :: Wiley, 2019.

Subjects :: Halftone
business.industry
Thin-film transistor
Computer science
law
Optoelectronics
Process architecture
Photolithography
business
law.invention

Tools