Ultraviolet Nanosecond Laser Annealing for Low Temperature 3D-Sequential Integration Gate Stack

Authors :: Anne-Sophie Royet
Claire Fenouillet-Beranger
Laurent Brunet
Pablo Acosta-Alba
Sebastien Kerdiles
Cédric Perrot
F. Aussenac
Jessica Lassarre
Source :: ECS Transactions. 93:19-22
Publication Year :: 2019
Publisher :: The Electrochemical Society, 2019.

Subjects :: Materials science
business.industry
Annealing (metallurgy)
medicine
Gate stack
Optoelectronics
Nanosecond laser
business
medicine.disease_cause
Ultraviolet

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