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Interplay of electron correlations and localization in disorderedβ-tantalum films: Evidence from dc transport and spectroscopic ellipsometry study
- Source :
- Applied Physics Letters. 106:051907
- Publication Year :
- 2015
- Publisher :
- AIP Publishing, 2015.
-
Abstract
- We report the dc transport (5 K ≲ T ≲ 380 K) and spectroscopic ellipsometry (0.8 eV ≤ hν ≤ 8.5 eV, T ≃ 300 K) study of β-Ta films prepared by rf sputtering deposition as a function of their thickness in the range 2.5 nm ≲ d ≲ 200 nm. The dc transport of the β-Ta films with a thickness d ≳ 25 nm is characterized by negative temperature coefficient of resistivity (TCR) caused by localization effects peculiar of highly disordered metals. Their dielectric function spectra display non-metallic-like behavior due to the presence of the pronounced band at 2 eV. We found that with increasing TCR absolute value, specifying elevated degree disorder, the optical spectral weight (SW) of free charge carriers decreases. The associated SW is recovered in the range of Mott-Hubbard transitions, indicating the mechanism of localization enhancement by electronic correlations in disordered metals.
- Subjects :
- Materials science
Physics and Astronomy (miscellaneous)
Condensed matter physics
chemistry
Ellipsometry
Electrical resistivity and conductivity
Tantalum
chemistry.chemical_element
Charge carrier
Metal–insulator transition
Atmospheric temperature range
Sputter deposition
Temperature coefficient
Subjects
Details
- ISSN :
- 10773118 and 00036951
- Volume :
- 106
- Database :
- OpenAIRE
- Journal :
- Applied Physics Letters
- Accession number :
- edsair.doi...........b89fa6d571278489306c53a54046c882
- Full Text :
- https://doi.org/10.1063/1.4907862