Effect of increasing thickness on tensile-strained germanium grown on InGaAs buffer layers

We have investigated the optical properties of tensile-strained germanium grown on InGaAs buffer layers as a function of film thickness and buffer layer composition. We study the dependence of the photoluminescence as a function of the strain amplitude and degree of relaxation which are also monitored by X-ray diffraction and Raman spectroscopy. We show that 0.75% biaxially strained germanium can be obtained up to a thickness of 150 nm, a value sufficiently high to allow confinement of the spontaneous emission in a guiding structure. For large thicknesses (>200 nm) and large indium content in the buffer layer, a partial relaxation of the film is observed characterized by a large in-plane anisotropy of the germanium lattice. In this case, a difference of strain magnitude deduced either by microphotoluminescence spectra or by X-ray or Raman measurements is reported. We explain this difference by the sensitivity of microphotoluminescence to the local properties of the material. This study provides guidelines...