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Submicrometre lift-off line with T-shaped cross-sectional form
- Source :
- Electronics Letters. 17:429
- Publication Year :
- 1981
- Publisher :
- Institution of Engineering and Technology (IET), 1981.
-
Abstract
- A fine metal line with T-shaped cross-sectional form was fabricated by a lift-off technique using the double-layer electron beam resist method. The minimum lower and upper widths of the T-shaped cross-section were 0.2 μm and 0.7 μm, respectively, and, keeping the lower width within 0.3 μm, we could increase the upper width at will.
Details
- ISSN :
- 00135194
- Volume :
- 17
- Database :
- OpenAIRE
- Journal :
- Electronics Letters
- Accession number :
- edsair.doi...........b803859f3a3f644fafb84a1ebb8a9cdc