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Highly manufacturable 7nm FinFET technology featuring EUV lithography for low power and high performance applications
- Source :
- 2017 Symposium on VLSI Technology.
- Publication Year :
- 2017
- Publisher :
- IEEE, 2017.
-
Abstract
- 7nm CMOS FinFET technology featuring EUV lithography, 4th gen. dual Fin and 2nd gen. multi-eWF gate stack is presented, providing 20% faster speed or consuming 35% less total power over 10nm technology [1]. EUV lithography, fully applied to MOL contacts and minimum-pitched metal/via interconnects, can reduce >25% mask steps with higher fidelity and smaller CD variation. A VT of 6T HD SRAM cell are 1.29 for PD (PG) and 1.34 for PU, respectively.
- Subjects :
- 010302 applied physics
Materials science
business.industry
Extreme ultraviolet lithography
Sram cell
Gate stack
Nanotechnology
02 engineering and technology
021001 nanoscience & nanotechnology
01 natural sciences
Power (physics)
CMOS
Logic gate
0103 physical sciences
Optoelectronics
0210 nano-technology
business
Lithography
Next-generation lithography
Subjects
Details
- Database :
- OpenAIRE
- Journal :
- 2017 Symposium on VLSI Technology
- Accession number :
- edsair.doi...........b79e91f77f8eed94a126bb0cf3373e0f