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Ni-doped carbon nanotubes fabricated by pulsed laser ablation in liquid as efficient electrocatalysts for oxygen evolution reaction
- Source :
- Applied Surface Science. 547:149197
- Publication Year :
- 2021
- Publisher :
- Elsevier BV, 2021.
-
Abstract
- Transition–metal-doped carbon-based electrocatalysts have attracted attention as alternatives to noble metal electrocatalysts (e.g. IrO2 and RuO2) for oxygen evolution reaction (OER) because they are inexpensive and highly efficient. However, their poor catalytic activity and time-consuming synthesis remain a challenge. Herein, we report a facile and green technique using pulsed laser ablation for preparing Ni-doped multi-walled carbon nanotubes (Ni-MWCNTs) as OER catalysts. Ni-MWCNTs exhibit high surface area, oxygen-rich functional groups (e.g., hydroxyl and carboxyl), and successful doping of Ni in the carbon framework. The as-prepared Ni-MWCNTs exhibited excellent OER catalytic performance, with an overpotential of 320 mV at the current density of 10 mA cm−2 in an alkaline medium, which is lower than that of the commercial RuO2 catalyst. Furthermore, Ni-MWCNTs displayed the initial electrocatalytic activity after 10-h stability tests, demonstrating good electrochemical durability. We believe that this work provides a simple protocol for fabricating heteroatom-doped carbon nanotubes as high-performance OER electrocatalysts.
- Subjects :
- Materials science
General Physics and Astronomy
chemistry.chemical_element
02 engineering and technology
Carbon nanotube
engineering.material
Overpotential
010402 general chemistry
Electrochemistry
01 natural sciences
Catalysis
law.invention
law
Doping
Oxygen evolution
Surfaces and Interfaces
General Chemistry
021001 nanoscience & nanotechnology
Condensed Matter Physics
0104 chemical sciences
Surfaces, Coatings and Films
Chemical engineering
chemistry
engineering
Noble metal
0210 nano-technology
Carbon
Subjects
Details
- ISSN :
- 01694332
- Volume :
- 547
- Database :
- OpenAIRE
- Journal :
- Applied Surface Science
- Accession number :
- edsair.doi...........b76891894838015209c97f91a0cd8acb