Photo-sensitive Ge nanocrystal based films controlled by substrate deposition temperature

MLA

Catalin Negrila, et al. “Photo-Sensitive Ge Nanocrystal Based Films Controlled by Substrate Deposition Temperature.” Semiconductor Science and Technology, vol. 32, Aug. 2017, p. 105003. EBSCOhost, https://doi.org/10.1088/1361-6641/aa8154.

APA

Catalin Negrila, Ionel Stavarache, Valentin Adrian Maraloiu, P. Prepelita, G. Iordache, & Ion Gruia. (2017). Photo-sensitive Ge nanocrystal based films controlled by substrate deposition temperature. Semiconductor Science and Technology, 32, 105003. https://doi.org/10.1088/1361-6641/aa8154

Chicago

Catalin Negrila, Ionel Stavarache, Valentin Adrian Maraloiu, P. Prepelita, G. Iordache, and Ion Gruia. 2017. “Photo-Sensitive Ge Nanocrystal Based Films Controlled by Substrate Deposition Temperature.” Semiconductor Science and Technology 32 (August): 105003. doi:10.1088/1361-6641/aa8154.