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A Countermeasure for Chemical Contamination in Clean Rooms

Authors :
Isao Tanaka
Source :
Journal of the Society of Powder Technology, Japan. 44:361-366
Publication Year :
2007
Publisher :
The Society of Powder Technology, Japan, 2007.

Abstract

Control of chemical contaminant has become of great importance in addition to particle contamination in a clean room for manufacturing semiconductors, liquid crystal device and other electronics devices. In particular, acid gases, base gases, hydrocarbon gases, boron and phosphor could damage electrical properties of these devices. Therefore, the reduction of contaminant concentration in clean room air is required. In this paper, constitute materials for a clean room newly developed as countermeasure for chemical contamination are introduced. Then, their analysis and evaluation methods for chemical contamination are also described.

Details

ISSN :
18837239 and 03866157
Volume :
44
Database :
OpenAIRE
Journal :
Journal of the Society of Powder Technology, Japan
Accession number :
edsair.doi...........b6a7940ac047e20a0e59056606aa10be