Soft x-ray production from laser produced plasmas for lithography applications

Authors :: R. C. Spitzer
C. Cerjan
R. L. Kauffman
T. J. Orzechowski
D. W. Phillion
Source :: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 11:2986
Publication Year :: 1993
Publisher :: American Vacuum Society, 1993.
Abstract: Laser‐produced plasmas are investigated as a source for soft x‐ray projection lithography. The dependence of conversion efficiency on target material, intensity, wavelength, and pulse width is determined using absolutely calibrated detectors. Conversion efficiency greater than 1% into a 2.2 eV bandwidth is demonstrated for Sn targets, fulfilling the system source requirements.

Subjects :: Physics
business.industry
Detector
Energy conversion efficiency
General Engineering
Plasma
Laser
Electromagnetic radiation
law.invention
Wavelength
Optics
law
Optoelectronics
X-ray lithography
business
Lithography

ISSN :: 0734211X
Volume :: 11
Database :: OpenAIRE
Journal :: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Accession number :: edsair.doi...........b565f015f337c75f78b2ee9b5eac3a5b
Full Text :: https://doi.org/10.1116/1.586573