Area-selective atomic layer deposition of Al2O3 on SiNx with SiO2 as the nongrowth surface

Subjects

Subjects :

Surfaces and Interfaces
Condensed Matter Physics
Surfaces, Coatings and Films

Details

ISSN :

15208559 and 07342101

Volume :

40

Database :

OpenAIRE

Journal :

Journal of Vacuum Science & Technology A

Accession number :

edsair.doi...........b530ee85b1e2326ea663e0b6e44e91e3

Full Text :

https://doi.org/10.1116/6.0001449