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Wide band gap ferromagnetic semiconductors and oxides

Authors :
Nikoleta Theodoropoulou
Jihyun Kim
David P. Norton
Yun Daniel Park
M. E. Overberg
G. T. Thaler
Stephen J. Pearton
Cammy R. Abernathy
Lynn A. Boatner
Arthur F. Hebard
Fan Ren
Source :
Journal of Applied Physics. 93:1-13
Publication Year :
2003
Publisher :
AIP Publishing, 2003.

Abstract

Recent advances in the theory and experimental realization of ferromagnetic semiconductors give hope that a new generation of microelectronic devices based on the spin degree of freedom of the electron can be developed. This review focuses primarily on promising candidate materials (such as GaN, GaP and ZnO) in which there is already a technology base and a fairly good understanding of the basic electrical and optical properties. The introduction of Mn into these and other materials under the right conditions is found to produce ferromagnetism near or above room temperature. There are a number of other potential dopant ions that could be employed (such as Fe, Ni, Co, Cr) as suggested by theory [see, for example, Sato and Katayama-Yoshida, Jpn. J. Appl. Phys., Part 2 39, L555 (2000)]. Growth of these ferromagnetic materials by thin film techniques, such as molecular beam epitaxy or pulsed laser deposition, provides excellent control of the dopant concentration and the ability to grow single-phase layers. T...

Details

ISSN :
10897550 and 00218979
Volume :
93
Database :
OpenAIRE
Journal :
Journal of Applied Physics
Accession number :
edsair.doi...........b3d4c6283c55514ff6fe480a0bd26651