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40nm & 22nm Embedded Charge Trap Flash for Automotive Applications

Authors :
Kobi Danon
Unsoon Kim
Shiva Shetty
Tim Thurgate
Stefano Amato
Yu Sun
Yoram Betser
P.K. Singh
Amichai Givant
Inkuk Kang
Jonas Neo
Kuo-Tung Chang
Chun Chen
James Pak
Amy Tu
Source :
2018 IEEE International Memory Workshop (IMW).
Publication Year :
2018
Publisher :
IEEE, 2018.

Abstract

Key attributes of Embedded Charge Trap (eCTTM) Flash technology are presented. Automotive MCUs with 40nm eCT Flash are currently in volume production at UMC. The eCT technology features industry-leading cell size at the 40nm node, and scaling by more than 30% has been demonstrated at the 22nm node. eCT utilizes source-side injection (SSI) for programming and band-to-band (BTB) hot- hole injection for erasing to meet the high-speed requirements of automotive applications. Furthermore, random access time of 8 ns is achieved across the full range of operational temperature (-40 °C to 150 °C) and voltage (0.99 V to 1.21 V).

Details

Database :
OpenAIRE
Journal :
2018 IEEE International Memory Workshop (IMW)
Accession number :
edsair.doi...........b375ad69f2d1c2ee51222dd87e3fb514
Full Text :
https://doi.org/10.1109/imw.2018.8388778