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40nm & 22nm Embedded Charge Trap Flash for Automotive Applications
- Source :
- 2018 IEEE International Memory Workshop (IMW).
- Publication Year :
- 2018
- Publisher :
- IEEE, 2018.
-
Abstract
- Key attributes of Embedded Charge Trap (eCTTM) Flash technology are presented. Automotive MCUs with 40nm eCT Flash are currently in volume production at UMC. The eCT technology features industry-leading cell size at the 40nm node, and scaling by more than 30% has been demonstrated at the 22nm node. eCT utilizes source-side injection (SSI) for programming and band-to-band (BTB) hot- hole injection for erasing to meet the high-speed requirements of automotive applications. Furthermore, random access time of 8 ns is achieved across the full range of operational temperature (-40 °C to 150 °C) and voltage (0.99 V to 1.21 V).
Details
- Database :
- OpenAIRE
- Journal :
- 2018 IEEE International Memory Workshop (IMW)
- Accession number :
- edsair.doi...........b375ad69f2d1c2ee51222dd87e3fb514
- Full Text :
- https://doi.org/10.1109/imw.2018.8388778