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Machine learning modeling using process context and exposure data for overlay prediction

Authors :
Wei-Hung Wang
Irina Brinster
Mohsen Maniat
Fatima Anis
Yen Hui Lee
Sven Bosese
C.F. Tseng
Wei Yuan Chu
Boris Habets
C.H. Huang
Elvis Yang
T.H. Yang
K.C. Chen
Source :
Metrology, Inspection, and Process Control XXXVI.
Publication Year :
2022
Publisher :
SPIE, 2022.

Details

Database :
OpenAIRE
Journal :
Metrology, Inspection, and Process Control XXXVI
Accession number :
edsair.doi...........b2541cdb4a4f88afc5f3953d30a1b1a3
Full Text :
https://doi.org/10.1117/12.2613202