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Dual-functional multilayer for high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm
- Source :
- High Power Laser and Particle Beams. 23:1299-1302
- Publication Year :
- 2011
- Publisher :
- Shanghai Institute of Optics and Fine Mechanics, 2011.
-
Abstract
- A dual-functional extreme ultraviolet(EUV) multilayer (ML) mirror was designed for high-reflectivity at 19.5 nm ( Fe Ⅻ line ) and low-reflectivity at 30.4 nm ( He Ⅱ line ). The design based on genetic algorithm (GA) utilized a stack composed of two periodic multilayers: a bottom multilayer for high reflectivity at 19.5 nm, and a top multilayer for low-reflectivity at 30.4 nm. The multilayer mirror was prepared by direct current magnetron sputtering, and characterized by grazing-incident X-ray diffraction(XRD) and synchrotron radiation(SR). The experiment results show that the dual-functional multilayer achieves the reflectivity of 33.3% at 19.5 nm and 9.6×10-4 at 30.4 nm at incident angle of 13°.
- Subjects :
- Diffraction
Materials science
business.industry
High reflectivity
Extreme ultraviolet lithography
Synchrotron radiation
Reflectivity
Atomic and Molecular Physics, and Optics
Stack (abstract data type)
Extreme ultraviolet
Optoelectronics
Electrical and Electronic Engineering
business
Line (formation)
Subjects
Details
- ISSN :
- 10014322
- Volume :
- 23
- Database :
- OpenAIRE
- Journal :
- High Power Laser and Particle Beams
- Accession number :
- edsair.doi...........b0b0cf1af4d2dd8e6bb451fa1ffb2770