Back to Search Start Over

Progress with MEMS x-ray micro pore optics

Authors :
Tomohiro Ogawa
Yuichiro Ezoe
Teppei Moriyama
Hitomi Yamaguchi
Kazuo Nakajima
Ikuyuki Mitsuishi
Kazuhisa Mitsuda
Takaya Ohashi
Ryutaro Maeda
Yoshiaki Kanamori
Kohei Morishita
Takuya Kakiuchi
Mitsuhiro Horade
Susumu Sugiyama
Raul E. Riveros
Source :
SPIE Proceedings.
Publication Year :
2012
Publisher :
SPIE, 2012.

Abstract

Our development of ultra light-weight X-ray micro pore optics based on MEMS (Micro Electro Mechanical System) technologies is described. Using dry etching or X-ray lithography and electroplating, curvilinear sidewalls through a flat wafer are fabricated. Sidewalls vertical to the wafer surface are smoothed by use of high temperature annealing and/or magnetic field assisted finishing to work as X-ray mirrors. The wafer is then deformed to a spherical shape. When two spherical wafers with different radii of curvature are stacked, the combined system will be an approximated Wolter type-I telescope. This method in principle allows high angular resolution and ultra light-weight X-ray micro pore optics. In this paper, performance of a single-stage optic, coating of a heavy metal on sidewalls with atomic layer deposition, and assembly of a Wolter type-I telescope are reported.

Details

ISSN :
0277786X
Database :
OpenAIRE
Journal :
SPIE Proceedings
Accession number :
edsair.doi...........b004da0f4638a6dd5a6b39ca8cd2a274