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Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors
- Source :
- IEEE Electron Device Letters. 22:74-76
- Publication Year :
- 2001
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2001.
-
Abstract
- In this letter, we present experimental data showing that hot-carrier stress in laser annealed polycrystalline silicon thin-film transistors provokes an anomalous turn-on voltage variation. Although under various hot-carrier stress intensities the maximum transconductance degradation shows the same power-time dependent law, turn-on voltage can exhibit different behaviors. This observation lead to the conclusion that turn-on voltage depends on two different degradation mechanisms: injection of hot carriers into the gate oxide and degradation of grain boundaries. We show that these two mechanisms may be distinguished since they obey different power-time dependent laws as a function of stress duration.
- Subjects :
- Materials science
Silicon
business.industry
Transconductance
Transistor
chemistry.chemical_element
engineering.material
Electronic, Optical and Magnetic Materials
law.invention
Stress (mechanics)
Polycrystalline silicon
chemistry
Gate oxide
law
Thin-film transistor
Electronic engineering
engineering
Optoelectronics
Grain boundary
Electrical and Electronic Engineering
business
Subjects
Details
- ISSN :
- 15580563 and 07413106
- Volume :
- 22
- Database :
- OpenAIRE
- Journal :
- IEEE Electron Device Letters
- Accession number :
- edsair.doi...........afba8b985e309ff3e37a6d0b88578c29