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Full integration of a pressure-sensor system into a standard BiCMOS process
- Source :
- Sensors and Actuators A: Physical. 67:211-214
- Publication Year :
- 1998
- Publisher :
- Elsevier BV, 1998.
-
Abstract
- We report a novel process for the full integration of surface-micromachined pressure-sensor cells into a standard BiCMOS process. Only the standard layers of the BiCMOS process are used to build up the sensor and only one additional photolithography step is necessary to achieve the micromachined structures. The application of the process is demonstrated by means of an integrated pressure-sensor system at a working range of 0.1 to 1.1 bar of absolute pressure. The influence of process parameters and tolerances of the VLSI process on the sensor performance are examined. To examine the long-term stability, the sensors are electrically deflected at the resonance frequency applying 4 × 10 11 load cycles. The measurements do not show any changes in the mechanical behaviour, so a very high long-term stability can be proven. In contrast to all integrated micromechanical systems presented so far, neither prenor post-processing of the system is necessary. Compared to conventional surface micromachining, the additional processing effort for the sensor realization is reduced dramatically to about 5% of the BiCMOS process.
- Subjects :
- Very-large-scale integration
Engineering
Bar (music)
business.industry
Metals and Alloys
Process (computing)
Electrical engineering
Condensed Matter Physics
Pressure sensor
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
law.invention
Working range
Surface micromachining
law
Process integration
Electronic engineering
Electrical and Electronic Engineering
Photolithography
business
Instrumentation
Subjects
Details
- ISSN :
- 09244247
- Volume :
- 67
- Database :
- OpenAIRE
- Journal :
- Sensors and Actuators A: Physical
- Accession number :
- edsair.doi...........af038809eeb857ef3b2a32549625ea4a