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Applying assist features to improve two dimensional feature process robustness

Authors :
Benjamin D. Painter
Levi D. Barnes
Lawrence S. Melvin
Source :
SPIE Proceedings.
Publication Year :
2005
Publisher :
SPIE, 2005.

Abstract

Sub-resolution assist features are an important tool for improving process robustness for one-dimensional pattern features at advanced manufacturing process nodes. However, sub-resolution assist feature development efforts have not generally considered optimization for process robustness with two-dimensional pattern features. This generally arises both from conservatively placing SRAFs to avoid the possibility of imaging, and from a desire to simplify SRAF placement rules. By studying two-dimensional features using a manufacturing sensitivity model, one can gain insight into the capabilities of SRAFs regarding two-dimensional pattern features. These insights suggest new methodologies for shaping assist features to enhance two-dimensional feature robustness. In addition, a manufacturing sensitivity model form can be employed to optimize the placement of multiple competing SRAFs in localized two-dimensional regions. Initial studies demonstrate significant pullback reduction for two-dimensional features once SRAF placement has been optimized using the manufacturing sensitivity model form.

Details

ISSN :
0277786X
Database :
OpenAIRE
Journal :
SPIE Proceedings
Accession number :
edsair.doi...........ac7a212a089734a8ee0cca1c3bc9723b