Back to Search
Start Over
Fabrication of PECVD-silicon oxynitride-based optical waveguides
- Source :
- Materials Science and Engineering: B. 112:154-159
- Publication Year :
- 2004
- Publisher :
- Elsevier BV, 2004.
-
Abstract
- In this work, we report on the optimization of all process steps for the fabrication of optical waveguides with high index contrast by using as core and cladding layers silicon oxynitride films deposited by plasma enhanced chemical vapor deposition at low temperatures. The main advantage of using this material, besides allowing the integration of optical and microelectronic devices, is the possibility of controlling accurately the refractive index over a wide range ( n = 1.46–2) allowing in this way a precise control of the index contrast and favoring a high integration density and relatively small dimensions in optical integrated circuits.
- Subjects :
- Materials science
Fabrication
Silicon photonics
Silicon oxynitride
business.industry
Mechanical Engineering
Condensed Matter Physics
Cladding (fiber optics)
Waveguide (optics)
chemistry.chemical_compound
Optics
chemistry
Mechanics of Materials
Plasma-enhanced chemical vapor deposition
Optoelectronics
General Materials Science
business
Plasma processing
Refractive index
Subjects
Details
- ISSN :
- 09215107
- Volume :
- 112
- Database :
- OpenAIRE
- Journal :
- Materials Science and Engineering: B
- Accession number :
- edsair.doi...........ab20fc0798875fe64182d3c9b7c28bdd