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Microcrystalline silicon prepared at magnetic field modified nucleation
- Source :
- Journal of Non-Crystalline Solids. 352:901-905
- Publication Year :
- 2006
- Publisher :
- Elsevier BV, 2006.
-
Abstract
- We present a complex characterization of thin silicon films, the growth of which has been influenced by permanent magnet, placed under the substrate. The pattern of microcrystalline regions in otherwise amorphous film varied with the orientation of the magnetic field. Study by atomic force microscopy and by micro-Raman spectroscopy revealed that the microcrystalline regions resulted from increased nucleation density of crystalline grains at the locations where the magnetron effect could be expected. This phenomenon allowed us to study in detail the transition between amorphous and microcrystalline growth. Moreover, it can be used as a kind of ‘magnetic lithography’ for preparation of predefined microcrystalline patterns in otherwise amorphous silicon films.
- Subjects :
- Amorphous silicon
Silicon
Nanocrystalline silicon
Analytical chemistry
Nucleation
chemistry.chemical_element
Substrate (electronics)
Condensed Matter Physics
Electronic, Optical and Magnetic Materials
Amorphous solid
chemistry.chemical_compound
Microcrystalline
chemistry
Materials Chemistry
Ceramics and Composites
Thin film
Composite material
Subjects
Details
- ISSN :
- 00223093
- Volume :
- 352
- Database :
- OpenAIRE
- Journal :
- Journal of Non-Crystalline Solids
- Accession number :
- edsair.doi...........aad96defeafe81b84df5ed1a5e87e871
- Full Text :
- https://doi.org/10.1016/j.jnoncrysol.2005.11.071