Approach to High Deposition Rate with Gradient Facing Targets System (V cathodes)

Facing targets sputter deposition provides defect-less quenched films, which do not sustain plasma damage so much. In order to improve its low efficiencies of target erosion and deposition rate, gradient facing targets system, V cathodes, is proposed. Through this improvement the sputtering voltage is reduced about 5%, the deposition rate is doubled and the film thickness becomes more uniform in comparison with those for conventional facing targets.