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Mechanical and thermophysical properties of PECVD oxynitride films measured by MEMS
- Source :
- Thin Solid Films. :626-631
- Publication Year :
- 2001
- Publisher :
- Elsevier BV, 2001.
-
Abstract
- Silicon oxynitride films (SiOxNy) are of great importance for opto-electronic applications and are promising for the development of microelectromechanical systems (MEMS). This work presents a theoretical model to determine the modulus of elasticity, the thermal expansion coefficient, and the thermal conductivity of rf-plasma enhanced CVD SiOxNy films using suspended micromachined beams. The model predicts the occurrence of well-defined deformations (buckling) of a fixed-end microbeam when this microbeam is subjected to controlled thermal compression forces. The mechanical and thermophysical properties are obtained through the measurement of the beam deflection. The results show that microbeams with a 20 μm width and a 1000 μm length readily exhibit observable buckling when electrical voltages in the range of 0.1–0.3 V are applied to the resistor. This confirms the feasibility of fabricating SiOxNy microbeams and the use of these microstructures for its mechanical and thermophysical characterization.
- Subjects :
- Microelectromechanical systems
Silicon oxynitride
Materials science
Metals and Alloys
Young's modulus
Surfaces and Interfaces
Microbeam
Thermal expansion
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
chemistry.chemical_compound
symbols.namesake
Thermal conductivity
chemistry
Buckling
Plasma-enhanced chemical vapor deposition
Materials Chemistry
symbols
Composite material
Subjects
Details
- ISSN :
- 00406090
- Database :
- OpenAIRE
- Journal :
- Thin Solid Films
- Accession number :
- edsair.doi...........a914d9d435d35edf4795058a24764f6b