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Extreme ultraviolet source at 6.7 nm based on a low-density plasma
- Source :
- Applied Physics Letters. 99:191502
- Publication Year :
- 2011
- Publisher :
- AIP Publishing, 2011.
-
Abstract
- We demonstrate an efficient extreme ultraviolet (EUV) source for operation at λ = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.
Details
- ISSN :
- 10773118 and 00036951
- Volume :
- 99
- Database :
- OpenAIRE
- Journal :
- Applied Physics Letters
- Accession number :
- edsair.doi...........a69e2613360081d85f839a9fc50f7865
- Full Text :
- https://doi.org/10.1063/1.3660275