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Extreme ultraviolet source at 6.7 nm based on a low-density plasma

Authors :
Gerry O'Sullivan
Weihua Jiang
Deirdre Kilbane
Padraig Dunne
Akira Endo
Noboru Yugami
Takamitsu Otsuka
Bowen Li
Takeshi Higashiguchi
Source :
Applied Physics Letters. 99:191502
Publication Year :
2011
Publisher :
AIP Publishing, 2011.

Abstract

We demonstrate an efficient extreme ultraviolet (EUV) source for operation at λ = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.

Details

ISSN :
10773118 and 00036951
Volume :
99
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........a69e2613360081d85f839a9fc50f7865
Full Text :
https://doi.org/10.1063/1.3660275