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Diffusion saturation of nondoped hydrated amorphous silicon by tin impurity

Authors :
V. M. Tsmots
V. B. Neimash
A. N. Kabaldin
V. S. Shtym
Source :
Semiconductors. 32:263-266
Publication Year :
1998
Publisher :
Pleiades Publishing Ltd, 1998.

Abstract

The effect of radiation defects on the field and temperature dependences of the magnetic susceptibility of single-crystal Si was studied. A nonlinear magnetic-field-dependence of the magnetic susceptibility of irradiated Si was observed. This behavior can be explained by magnetic ordering of A centers. It was concluded that clusters of these centers with a local density of the order of 1021 cm−3 exist. An explanation of the “diffusion paradox” in the formation of oxygen-containing thermal donors was proposed on the basis of micrononuniformities of the spatial distribution of thermal donors and interstitial oxygen in Si.

Details

ISSN :
10906479 and 10637826
Volume :
32
Database :
OpenAIRE
Journal :
Semiconductors
Accession number :
edsair.doi...........a5c778a76db9601f7333ea1e6674beb8