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Diffusion saturation of nondoped hydrated amorphous silicon by tin impurity
- Source :
- Semiconductors. 32:263-266
- Publication Year :
- 1998
- Publisher :
- Pleiades Publishing Ltd, 1998.
-
Abstract
- The effect of radiation defects on the field and temperature dependences of the magnetic susceptibility of single-crystal Si was studied. A nonlinear magnetic-field-dependence of the magnetic susceptibility of irradiated Si was observed. This behavior can be explained by magnetic ordering of A centers. It was concluded that clusters of these centers with a local density of the order of 1021 cm−3 exist. An explanation of the “diffusion paradox” in the formation of oxygen-containing thermal donors was proposed on the basis of micrononuniformities of the spatial distribution of thermal donors and interstitial oxygen in Si.
- Subjects :
- Amorphous silicon
Materials science
Condensed matter physics
chemistry.chemical_element
equipment and supplies
Condensed Matter Physics
Magnetic susceptibility
Oxygen
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials
chemistry.chemical_compound
Nuclear magnetic resonance
chemistry
Impurity
Thermal
Irradiation
Tin
human activities
Saturation (magnetic)
Subjects
Details
- ISSN :
- 10906479 and 10637826
- Volume :
- 32
- Database :
- OpenAIRE
- Journal :
- Semiconductors
- Accession number :
- edsair.doi...........a5c778a76db9601f7333ea1e6674beb8